High‑Purity Quartz Flow Equalization Baffles are precision-engineered components designed to regulate and stabilize the flow of process gases during high-temperature semiconductor manufacturing steps such as diffusion, oxidation, and CVD deposition. Installed within the furnace system, these baffles guide and evenly distribute gas across the wafer surface, helping to maintain uniform gas concentration and temperature throughout the quartz boat.

Made from high-purity fused quartz, these baffles offer outstanding thermal stability, excellent resistance to chemical corrosion, and extremely low impurity content—ensuring clean and controlled processing environments. The sandblasted surface improves gas dispersion performance while minimizing particle generation. By promoting consistent gas exposure, these baffles contribute to improved layer uniformity, reduced defect rates, and higher process yields in both production lines and R&D settings.

Flow Equalization Baffles' Purpose and Function in Semiconductor Processing

What are Flow Equalization Baffles?

Flow equalization baffles are precision-engineered quartz components installed inside diffusion, oxidation, and CVD (Chemical Vapor Deposition) furnaces. They guide and disperse process gases evenly throughout the furnace chamber, preventing uneven gas concentration or temperature gradients that could cause defects or inconsistent doping.

How Flow Equalization Baffles Work?

The baffles typically feature multiple small holes or perforations designed to break up and redistribute gas streams. This equalization creates laminar, stable gas flow across the wafer surface. Made from high-purity quartz, the baffles resist high temperatures and corrosive gases common in semiconductor processes, ensuring durability and contamination-free operation.

Applications in Semiconductor Processing

Flow equalization baffles are critical in processes such as:

• Diffusion
• Oxidation
• Chemical Vapor Deposition (CVD)

They are used in batch processing furnaces where multiple wafers are processed simultaneously and uniformity is crucial.