The 6 inch quartz gas distribution baffle is a critical component designed to ensure uniform gas flow within semiconductor processing furnaces. Made from high-purity quartz, this baffle provides excellent thermal stability and chemical resistance under high-temperature conditions, contributing to consistent process environments.

Its precision-engineered design evenly disperses process gases across wafers or substrates, minimizing gas flow turbulence and promoting uniform thermal distribution. This leads to improved process repeatability, reduced defects, and higher product yield.